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Influence of the Target Environment on Angular Distribution of Sputtered Particles

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Erosion and Growth of Solids Stimulated by Atom and Ion Beams

Part of the book series: NATO ASI Series ((NSSE,volume 112))

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Abstract

Angular distributions of sputtered Ag atoms have been measured under various target environments by a combination of a collector technique and Auger electron spectroscopy. The obtained results show that sputtering under Ultra High Vacuum (UHV) conditions leads to an isotropic, cosine-like distribution, while the high partial pressure of impurities causes the distribution to be strongly outward-peaked. Ion beam-induced-texturing effects are also investigated.

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References

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Author information

Authors and Affiliations

  1. Fysisk Institut, DK-5230, Odense M, Denmark

    W. Huang & J. Onsgaard

  2. Instytut Fizyki, Uniwersytet Jagiellonski, Reymonta 4, 30-059, Krakow, Poland

    M. Szymonski

Authors
  1. W. Huang
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  2. J. Onsgaard
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  3. M. Szymonski
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Editor information

Editors and Affiliations

  1. Physics Department, University of Crete, Heraklion, Crete, Greece

    G. Kiriakidis

  2. Department of Electronic and Electrical Engineering, University of Salford, Salford, UK

    G. Carter

  3. Physics Department, Queen’s University, Kingston, Canada

    J. L. Whitton

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© 1986 Martinus Nijhoff Publishers, Dordrecht

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Huang, W., Onsgaard, J., Szymonski, M. (1986). Influence of the Target Environment on Angular Distribution of Sputtered Particles. In: Kiriakidis, G., Carter, G., Whitton, J.L. (eds) Erosion and Growth of Solids Stimulated by Atom and Ion Beams. NATO ASI Series, vol 112. Springer, Dordrecht. https://doi.org/10.1007/978-94-009-4422-0_27

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  • DOI: https://doi.org/10.1007/978-94-009-4422-0_27

  • Publisher Name: Springer, Dordrecht

  • Print ISBN: 978-94-010-8468-0

  • Online ISBN: 978-94-009-4422-0

  • eBook Packages: Springer Book Archive

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